Photoresist binders
- Technology
- Photoresist binders
- Alkaline developable resins
- KELLOMER LP-5104
KELLOMER LP-5104
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Description
· Modified epoxy tetraacrylate with carboxyl group
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Key features
· Acid functionality
· Alkali developable
· High sensitivity
· Good thermal, chemical and
mechanical resistance -
Functionality No.
4
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Diluent (%)
Ethyl carbitol
acetate
30 -
Color(APHA)
600 max
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Viscosity (cps, 25℃)
33,000 (60℃)
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Refractive index (25℃)
1.519
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Polymer solid (%)
70
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Molecular weight (Mw, g/mol)
7100
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Gel content (%)
N/A
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Cure speed (dosage, mJ/cm2)
N/A
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Pencil hardness
N/A
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Tensile strength(PSI)
N/A
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Elongation(%)
N/A
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Solvent resistance (MEK rubbing)
N/A
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Yellow index (ΔE)
N/A
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Gloss(60º)
N/A
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Reactivity
4
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Hardness
3
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Flexibility
2
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Adhesion
2
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Chemical resistance
2
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Scratch resistance
2
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Acid value(mgKOH/g)
80.7
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Application
· Photo imageable solder resists for PCB
· Adhesion to metalized substrates
· Heat resistance applications
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